ion plating

Physical process of reactive low voltage ion plating

低压反应离子镀的物理过程

By combination of DC reaction magnetron sputtering with multiple arc ion plating, the superhard C 3N 4/ TiN compound film is deposited onto HSS base.

采用DC反应磁控溅射和多弧离子镀相结合的方法，在高速钢基体上沉积C3N4/TiN复合超硬薄膜。

Mechanical properties and microstructures of black hard films of Ti/ TiN/ Ti ( N, C)/ TiC, grown on industrial scale by cylindrical arc ion plating on substrates with different hardness using our home made apparatus, were tentatively preliminarily characterized.

利用自制的柱弧离子镀膜机，在不同硬度基体上制备了Ti/TiN/Ti（N，C）/TiC多层复合膜。

Magnetic plate manufactured by vacuum evaporating and arc ion plating

真空蒸发及弧光离子镀制做磁盘

A Study on Optical Coatings by Reactive Ion Plating

光学薄膜反应离子镀技术研究

Preparation of ITO films by reactive low voltage ion plating

低压反应离子镀方法制备ITO透明导电膜

Study of Texture for TiN Coating by Ion Plating

离子镀TiN膜织构的研究

A Mathematical Model for Optical Films Deposited by Reactive Ion Plating

等离子体镀光学薄膜的数学模型

Study of single layer inhomogeneous Ge_ ( 1-x) C_x antireflection coating prepared by reactive low voltage ion plating technique

用低压反应离子镀的方法制备Ge（1-x）C x单层非均匀增透膜的研究

He effect of nitrogen partial pressure on properties of titanium nitride coating by using hollow cathode discharge ion plating process has been investigated.

研究了氮分压对空心阴极离子镀氮化钛涂层性能的影响。

Plasma Ion Source for Low Voltage Reactive Ion Plating

低压反应离子镀等离子源的研制

The influence of the activating source power on tin coatings deposited on the matrix of HSS by reactive sputtering ion plating

活化源功率对高速钢基体反应溅射离子镀TiN涂层的影响

Process and Property of the ZrN Coating Made by Vacuum Arc Ion Plating

真空电弧离子镀ZrN涂层的工艺与性能

A reasonable technology of preparation of gradient hard coatings by multi-arc ion plating was introduced.

采用多弧离子镀技术制备了Ti（C，N）基金属陶瓷功能梯度材料。

Study on Aluminium Ion Plating

离子镀铝工艺研究

Oxidation properties of tin coating by ion plating at high temperature

离子镀TiN涂层的高温氧化特性

Microstructure and hardness of chromium oxide coatings by arc ion plating

电弧离子镀氧化铬涂层的组织结构及硬度

Cathodic arc ion plating ( CAIP ) has been widely applied in modern technology field.

多弧离子镀在现代科技领域中有着广泛的应用.

Plasma physics of optical film deposition by reactive ion plating

离子镀光学薄膜的等离子体物理过程

NiCrAlY coating was deposited on Ti 6 Al 4 V substrate by arc ion plating ( AIP ).

采用电弧离子镀 ( AIP ) 技术在Ti6Al4V基体表面沉积制备了NiCrAlY涂层.

Effects of Pulse Bias on TiN Coating in Arc Ion Plating

电弧离子镀技术中脉冲偏压对TiN薄膜的影响

Study of CrN_x Coatings Deposited on 2024 Aluminium Alloys by Multi-Arc Ion Plating

2024铝合金表面电弧镀CrN x多层膜的研究

This article mainly describes the preparation of ZnO thin films with highly orientation using RF reactive ion plating, RF reactive sputtering, MOCVD, and laser-assist evaporation, etc.

本文主要叙述采用RF反应离子镀、RF反应溅射、MOCVD和激光辅助蒸发等方法制备高度取向的ZnO薄膜。

Research on Ion Plating Surface Modification of Dental Prosthetic Material

口腔修复材料离子镀表面改性的研究

KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC.

中文关键词: 气离溅射 、 离子源 、 阳极层流 、 溅射 、 氮化钛 、 离子镀膜 、 中频 、 脉冲直流.

High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.

溅射镀膜方法是制备ITO透明导电膜最常用也是实验研究最多的方法。

A new multi-arc ion plating automatic system consisted of IIC and PLC is introduced.

利用工控机(IIC) 和PLC研制 成了新型多弧离子镀膜机自动控制系统,该控制系统可以实现镀膜工艺过程的自动控制.

A New Technology of Surface Hardening for Metals and Non-Metals-Glow Ion Plating Film

金属和非金属表面强化处理的新技术&辉光离子镀膜

The Effect of Nitrogen Partial Pressure on the Properties of Titanium Nitride Coating by Using Ion Plating Process

氮分压对离子镀氮化钛涂层的影响

Effect of Ion Plating Technology on the Performance of Superhard Coating

离子镀膜工艺对刀片刃口性能的影响